Deadline: 21 February 2017
International Women’s Media Foundation (IWMF) is inviting women journalists from all over the world for its Reporting Fellowships to the Democratic Republic of the Congo. The programme will take place in May 2017.
Both groups of reporting Fellows will begin their trip in Nairobi, Kenya, where they will complete orientation and Hostile Environments and First Aid Training (HEFAT) May 4 – 7. Fellows then depart for a week of in-country work May 8 – 17 from Lubumbashi and surrounding areas in southeast Katanga province, or Goma. Fellows will have the opportunity to network with other journalists, report independently and collaboratively with their peers, and gain access to a variety of sources and sites related to their reporting.
Benefits
- The IWMF arranges travel and in-country logistics for all Fellows within the scope of the Fellowship base location and trip dates.
- The IWMF also covers Fellowship-related costs within the framework of the reporting trip including travel, lodging, meals, and fixers/interpreters, unless a selected journalist’s news organization wishes to assume these costs.
- Visa costs will also be covered. Fellows living outside the U.S. are responsible for procuring all necessary visas, for which they will be reimbursed at the conclusion of the Fellowship.
Eligibility Criteria
- Affiliated or freelance women journalists with three (3) or more years of professional experience working in news media. Please note that internships do not count toward professional experience.
- Women journalists of all nationalities are welcome to apply.
- Non-native English speakers must be proficient in English in order to fully participate in and benefit from the program.
- Applicants must be able to show proof of interest from an editor or have a proven track record of publication in prominent media outlets (a letter from an editor is strongly preferred).
How to Apply
Interested applicants must apply online via given website.
For more information, please visit IWMF Call for Applications.